Simulation of RF plasma flowing at low pressure

Abstract

© 2014, Pleiades Publishing, Ltd. A mathematical model that describes RF plasma flowing at a pressure of 13.3–133 Pa and a Knudsen number of 8 × 10−3 ≤ Kn ≤ 7 × 10−2 for the carrying gas is presented. The model is based on the statistical approach for a neutral plasma component and on a continuum model for electron and ion components. The results of the calculation for the neutral plasma component flowing in an undisturbed flow and, if the sample is in a circumfluent flow, are presented. The results of the calculation for the problem on an electron-ion gas are also given.