Stepanov A.; Vorobev V.; Rogov A.; Nuzhdin V.; Valeev V.
(2019)
© 2019 Elsevier B.V. The article describes the study of Si surface sputtering with the low-energy high-dose implantation by Ag+ ions with energy E = 30 keV and current density J = 8 μA/cm2. The radiation dose was D = 2.5 ...