Reactive magnetron sputtering model at making Ti-TiOx coatings

dc.contributor.author	Luchkin A.
dc.contributor.author	Kashapov N.
dc.date.accessioned	2018-09-18T20:25:17Z
dc.date.available	2018-09-18T20:25:17Z
dc.date.issued	2014
dc.identifier.issn	1742-6588
dc.identifier.uri	https://dspace.kpfu.ru/xmlui/handle/net/139716
dc.description.abstract	© Published under licence by IOP Publishing Ltd. Mathematical model of reactive magnetron sputtering for plant VU 700-D is described. Approximating curves for experimental current-voltage characteristic for two gas input schemas are shown. Choice of gas input schema influences on model parameters (mainly on pumping speed). Reactive magnetron sputtering model allows develop technology of Ti - TiOx coatings deposition without changing atmosphere and pressure in vacuum chamber.
dc.relation.ispartofseries	Journal of Physics: Conference Series
dc.title	Reactive magnetron sputtering model at making Ti-TiOx coatings
dc.type	Conference Paper
dc.relation.ispartofseries-issue	1
dc.relation.ispartofseries-volume	567
dc.collection	Публикации сотрудников КФУ
dc.source.id	SCOPUS17426588-2014-567-1-SID84914165894

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