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dc.contributor.author | Zhuikov V. | |
dc.date.accessioned | 2018-09-17T21:23:14Z | |
dc.date.available | 2018-09-17T21:23:14Z | |
dc.date.issued | 1999 | |
dc.identifier.issn | 1070-3632 | |
dc.identifier.uri | https://dspace.kpfu.ru/xmlui/handle/net/134924 | |
dc.description.abstract | Electrochemical oxidation of hexaalkyldisilanes in acetonitrile follows the activation mechanism with cleavage of the Si-Si bond in the overall two-electron process. Oxidation of hexamethyldisilane occurs at a potential 1 V more positive than the standard potential of the process. The standard potential of the leaving group Me3Si+/Me3Si is negative and large in value, which determines the activation character of the whole process. © 1999 MAHK "Hayka/Interperiodica". | |
dc.relation.ispartofseries | Russian Journal of General Chemistry | |
dc.title | Electrochemical oxidation of hexaalkyldisilanes | |
dc.type | Article | |
dc.relation.ispartofseries-issue | 12 | |
dc.relation.ispartofseries-volume | 69 | |
dc.collection | Публикации сотрудников КФУ | |
dc.relation.startpage | 1906 | |
dc.source.id | SCOPUS10703632-1999-69-12-SID23044518790 |