dc.contributor.author |
Zhuikov V. |
|
dc.date.accessioned |
2018-09-17T21:23:14Z |
|
dc.date.available |
2018-09-17T21:23:14Z |
|
dc.date.issued |
1999 |
|
dc.identifier.issn |
1070-3632 |
|
dc.identifier.uri |
https://dspace.kpfu.ru/xmlui/handle/net/134924 |
|
dc.description.abstract |
Electrochemical oxidation of hexaalkyldisilanes in acetonitrile follows the activation mechanism with cleavage of the Si-Si bond in the overall two-electron process. Oxidation of hexamethyldisilane occurs at a potential 1 V more positive than the standard potential of the process. The standard potential of the leaving group Me3Si+/Me3Si is negative and large in value, which determines the activation character of the whole process. © 1999 MAHK "Hayka/Interperiodica". |
|
dc.relation.ispartofseries |
Russian Journal of General Chemistry |
|
dc.title |
Electrochemical oxidation of hexaalkyldisilanes |
|
dc.type |
Article |
|
dc.relation.ispartofseries-issue |
12 |
|
dc.relation.ispartofseries-volume |
69 |
|
dc.collection |
Публикации сотрудников КФУ |
|
dc.relation.startpage |
1906 |
|
dc.source.id |
SCOPUS10703632-1999-69-12-SID23044518790 |
|