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ELEMENTARY MICROWAVE PLASMA SOURCES WITH EXTENDED OPERATING PARAMETERS (FROM LOW TO HIGH- PRESSURES) FOR LARGE AREA DEPOSITION

ELEMENTARY MICROWAVE PLASMA SOURCES WITH EXTENDED OPERATING PARAMETERS (FROM LOW TO HIGH- PRESSURES) FOR LARGE AREA DEPOSITION

Lacoste A.; Baele P.; Ortega A.M.; Bes A.; Bechu S.
URI: http://dspace.kpfu.ru/xmlui/handle/net/117505
Date: 2017

Abstract:

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