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MODELLING AND CHARACTERIZATION OF ELEMENTARY MICROWAVE PLASMA SOURCES AT MEDIUM PRESSURE (1 TO 50 TORR) FOR HIGH RATE DEPOSITION
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MODELLING AND CHARACTERIZATION OF ELEMENTARY MICROWAVE PLASMA SOURCES AT MEDIUM PRESSURE (1 TO 50 TORR) FOR HIGH RATE DEPOSITION
Ortega A.M.
;
Bes A.
;
Bechu S.
;
Lacoste A.
URI:
http://dspace.kpfu.ru/xmlui/handle/net/117382
Date:
2017
Abstract:
-
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"ФИЗИКА НИЗКОТЕМПЕРАТУРНОЙ ПЛАЗМЫ" ФНТП-2017
[232]
материалы Всероссийской (с международным участием) конференции "Физика низкотемпературной плазмы" ФНТП-2017 (Казань,5 - 9 июня 2017 г), 05.06.2017-09.06.2017
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