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The formation of structural imperfections in semiconductor silicon/ by V. I. Talanin and I. E. Talanin.

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dc.contributor.author Talanin V. I. ((Vitaliĭ Igorʹevich),)
dc.contributor.author Talanin I. E.
dc.date.accessioned 2024-01-29T23:41:07Z
dc.date.available 2024-01-29T23:41:07Z
dc.date.issued 2018
dc.identifier.citation Talanin V. I. The formation of structural imperfections in semiconductor silicon - 1 online resource (xii, 269 pages) : - URL: https://libweb.kpfu.ru/ebsco/pdf/1986604.pdf
dc.identifier.isbn 9781527523425
dc.identifier.isbn 152752342X
dc.identifier.uri https://dspace.kpfu.ru/xmlui/handle/net/182585
dc.description Includes bibliographical references (pages 239-267).
dc.description.abstract "Today, it is difficult to imagine all spheres of human activity without personal computers, solid-state electronic devices, micro- and nanoelectronics, photoconverters, and mobile communication devices. The basic material of modern electronics and for all of these industries is semiconductor silicon. Its properties and applications are determined by defects in its crystal structure. However, until now, there has been no complete and reliable description of the creation and transformation of such a defective structure. This book solves this mystery through two different approaches to semiconductor silicon: the classical and the probabilistic. This book brings together, for the first time, all existing experimental and theoretical information on the internal structure of semiconductor silicon. It will appeal to a wide range of readers, from materials scientists and practical engineers to students."--
dc.description.tableofcontents Chapter one. Growth of dislocation-free silicon single crystals from melt and defect formation -- Chapter two. Physical modeling of defect formation processes in dislocation-free single crystals of silicon -- Chapter three. Physical basis of a heterogenous (two-stage) model of grown-in microdefect formation -- Chapter four. High-temperature precipitation of impurity in dislocation-free silicon single crystals -- Chapter five. The formation of microvoids and interstitial dislocation loops during crystal cooling after growing -- Chapter six. General approach to the engineering of defects in semiconductor silicon.
dc.language English
dc.language.iso en
dc.subject.other Silicon -- Structure.
dc.subject.other Semiconductors -- Impurity distribution.
dc.subject.other Semiconductors -- Materials.
dc.subject.other Semiconductors -- Impurity distribution.
dc.subject.other Semiconductors -- Materials.
dc.subject.other TECHNOLOGY & ENGINEERING / Mechanical
dc.subject.other Electronic books.
dc.title The formation of structural imperfections in semiconductor silicon/ by V. I. Talanin and I. E. Talanin.
dc.type Book
dc.description.pages 1 online resource (xii, 269 pages) :
dc.collection Электронно-библиотечные системы
dc.source.id EN05CEBSCO05C4848


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