Molecular Dynamics Simulation of Copper Nanofilm Self-Assembly on Silicon Substrate under Gas-Discharge Plasma Conditions

dc.contributor.author	Fairushin I.I.
dc.contributor.author	Shemakhin A.Y.
dc.contributor.author	Khabir’yanova A.A.
dc.date.accessioned	2022-02-09T20:31:05Z
dc.date.available	2022-02-09T20:31:05Z
dc.date.issued	2021
dc.identifier.issn	0018-1439
dc.identifier.uri	https://dspace.kpfu.ru/xmlui/handle/net/168696
dc.description.abstract	Abstract: Using the molecular dynamics method, the sputtering of a copper target and the subsequent formation of a copper nanofilm on a silicon substrate has been modeled. The process parameters corresponded to the conditions in low-pressure gas-discharge plasma. The obtained values of the sputtering coefficient are consistent with experimental data. The nanofilm growth rate has been determined.
dc.relation.ispartofseries	High Energy Chemistry
dc.subject	copper nanofilm
dc.subject	gas discharge
dc.subject	molecular dynamics
dc.subject	self-assembly
dc.subject	sputtering
dc.title	Molecular Dynamics Simulation of Copper Nanofilm Self-Assembly on Silicon Substrate under Gas-Discharge Plasma Conditions
dc.type	Article
dc.relation.ispartofseries-issue	5
dc.relation.ispartofseries-volume	55
dc.collection	Публикации сотрудников КФУ
dc.relation.startpage	399
dc.source.id	SCOPUS00181439-2021-55-5-SID85115357777

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Публикации сотрудников КФУ Scopus [24551]
Коллекция содержит публикации сотрудников Казанского федерального (до 2010 года Казанского государственного) университета, проиндексированные в БД Scopus, начиная с 1970г.