Study of RF plasma flow at low pressure: Electron temperature influence

dc.contributor.author	Shemakhin A.Y.
dc.contributor.author	Zheltukhin V.S.
dc.contributor.author	Shemakhin E.Y.
dc.contributor.author	Pryalukin I.S.
dc.date.accessioned	2021-02-25T06:52:01Z
dc.date.available	2021-02-25T06:52:01Z
dc.date.issued	2020
dc.identifier.issn	1742-6588
dc.identifier.uri	https://dspace.kpfu.ru/xmlui/handle/net/161174
dc.description.abstract	© 2020 Published under licence by IOP Publishing Ltd. A mathematical model of low-pressure RF plasma flow taking into consideration electron temperature influence is presented. Results of calculations of carrier gas velocity, pressure and temperature as well as electron density and electron temperature in plasma flow are showed. Influence of electric field on electron temperature and plasma flow is analyzed.
dc.relation.ispartofseries	Journal of Physics: Conference Series
dc.title	Study of RF plasma flow at low pressure: Electron temperature influence
dc.type	Conference Paper
dc.relation.ispartofseries-issue	1
dc.relation.ispartofseries-volume	1588
dc.collection	Публикации сотрудников КФУ
dc.source.id	SCOPUS17426588-2020-1588-1-SID85090781521

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Коллекция содержит публикации сотрудников Казанского федерального (до 2010 года Казанского государственного) университета, проиндексированные в БД Scopus, начиная с 1970г.