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Study of RF plasma flow at low pressure: Electron temperature influence

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dc.contributor.author Shemakhin A.Y.
dc.contributor.author Zheltukhin V.S.
dc.contributor.author Shemakhin E.Y.
dc.contributor.author Pryalukin I.S.
dc.date.accessioned 2021-02-25T06:52:01Z
dc.date.available 2021-02-25T06:52:01Z
dc.date.issued 2020
dc.identifier.issn 1742-6588
dc.identifier.uri https://dspace.kpfu.ru/xmlui/handle/net/161174
dc.description.abstract © 2020 Published under licence by IOP Publishing Ltd. A mathematical model of low-pressure RF plasma flow taking into consideration electron temperature influence is presented. Results of calculations of carrier gas velocity, pressure and temperature as well as electron density and electron temperature in plasma flow are showed. Influence of electric field on electron temperature and plasma flow is analyzed.
dc.relation.ispartofseries Journal of Physics: Conference Series
dc.title Study of RF plasma flow at low pressure: Electron temperature influence
dc.type Conference Paper
dc.relation.ispartofseries-issue 1
dc.relation.ispartofseries-volume 1588
dc.collection Публикации сотрудников КФУ
dc.source.id SCOPUS17426588-2020-1588-1-SID85090781521


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  • Публикации сотрудников КФУ Scopus [24551]
    Коллекция содержит публикации сотрудников Казанского федерального (до 2010 года Казанского государственного) университета, проиндексированные в БД Scopus, начиная с 1970г.

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