dc.contributor.author |
Shemakhin A.Y. |
|
dc.contributor.author |
Zheltukhin V.S. |
|
dc.contributor.author |
Shemakhin E.Y. |
|
dc.contributor.author |
Pryalukin I.S. |
|
dc.date.accessioned |
2021-02-25T06:52:01Z |
|
dc.date.available |
2021-02-25T06:52:01Z |
|
dc.date.issued |
2020 |
|
dc.identifier.issn |
1742-6588 |
|
dc.identifier.uri |
https://dspace.kpfu.ru/xmlui/handle/net/161174 |
|
dc.description.abstract |
© 2020 Published under licence by IOP Publishing Ltd. A mathematical model of low-pressure RF plasma flow taking into consideration electron temperature influence is presented. Results of calculations of carrier gas velocity, pressure and temperature as well as electron density and electron temperature in plasma flow are showed. Influence of electric field on electron temperature and plasma flow is analyzed. |
|
dc.relation.ispartofseries |
Journal of Physics: Conference Series |
|
dc.title |
Study of RF plasma flow at low pressure: Electron temperature influence |
|
dc.type |
Conference Paper |
|
dc.relation.ispartofseries-issue |
1 |
|
dc.relation.ispartofseries-volume |
1588 |
|
dc.collection |
Публикации сотрудников КФУ |
|
dc.source.id |
SCOPUS17426588-2020-1588-1-SID85090781521 |
|