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Swelling and sputtering of porous germanium by silver ions

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dc.contributor.author Rogov A.
dc.contributor.author Gumarov A.
dc.contributor.author Tagirov L.
dc.contributor.author Stepanov A.
dc.date.accessioned 2020-01-15T22:13:40Z
dc.date.available 2020-01-15T22:13:40Z
dc.date.issued 2019
dc.identifier.issn 2452-2139
dc.identifier.uri https://dspace.kpfu.ru/xmlui/handle/net/157187
dc.description.abstract © 2019 Elsevier Ltd Surface processes for porous Ge (PGe) formed by low-energy high-dose implantation of Ag+ with an energy of E = 30 keV and a current density J = 5 μA/cm2 in dependence of the radiation dose D = 6.2·1014–1.5·1017 ion/cm2 where observed. Using X-ray photoelectron spectroscopy, it was found that for selected implantation conditions at D ≥ 9.3·1015 ion/cm2, Ag nanoparticles were synthesized in Ge, but formation of silver germanide (GeAg4) was not occur. Using scanning electron and atomic-force microscopy it was found that with increasing D up to ~1.9 × 1016 ion/cm2, a layer of porous germanium (Ag:PGe) is formed, accompanied by swelling of the implanted Ge surface up to 25 nm thick. With a further increase of D > 1.9·1016 ion/cm2, the opposite effect is observed, which consists of sputtering PGe at a constant rate of ~3.6 nm/min and an sputtering yield of ~17.2.
dc.relation.ispartofseries Composites Communications
dc.subject Ion implantation
dc.subject Porous germanium
dc.subject Silver ions
dc.subject Sputtering
dc.subject Swelling
dc.title Swelling and sputtering of porous germanium by silver ions
dc.type Article
dc.relation.ispartofseries-volume 16
dc.collection Публикации сотрудников КФУ
dc.relation.startpage 57
dc.source.id SCOPUS24522139-2019-16-SID85071630685


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  • Публикации сотрудников КФУ Scopus [24551]
    Коллекция содержит публикации сотрудников Казанского федерального (до 2010 года Казанского государственного) университета, проиндексированные в БД Scopus, начиная с 1970г.

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