dc.contributor.author |
Kashapov N. |
|
dc.contributor.author |
Luchkin A. |
|
dc.contributor.author |
Luchkin G. |
|
dc.date.accessioned |
2018-09-18T20:25:56Z |
|
dc.date.available |
2018-09-18T20:25:56Z |
|
dc.date.issued |
2014 |
|
dc.identifier.issn |
1757-8981 |
|
dc.identifier.uri |
https://dspace.kpfu.ru/xmlui/handle/net/139817 |
|
dc.description.abstract |
© Published under licence by IOP Publishing Ltd. Magnetron discharge at reactive and working gases mixture atmosphere current-voltage characteristic (I-U) for different sputtering parameters is investigated. It is shown, that form of volt-ampere characteristic doesn't depend on gas supply scheme at vacuum chamber pressure 4- 6.10-2 Pa. Reactive gas (oxygen) flow increasing leads to making I-U transition part wider and amplification of difference between top and bottom parts of hysteresis loop I-U. Discharge voltage is less at oxygen and argon gases mixture atmosphere than at argon atmosphere. |
|
dc.relation.ispartofseries |
IOP Conference Series: Materials Science and Engineering |
|
dc.title |
Magnetron discharge volt-ampere characteristic investigation at thin film coating process |
|
dc.type |
Conference Paper |
|
dc.relation.ispartofseries-issue |
1 |
|
dc.relation.ispartofseries-volume |
69 |
|
dc.collection |
Публикации сотрудников КФУ |
|
dc.source.id |
SCOPUS17578981-2014-69-1-SID84919459240 |
|