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dc.contributor.author | Kashapov N. | |
dc.contributor.author | Luchkin A. | |
dc.contributor.author | Luchkin G. | |
dc.date.accessioned | 2018-09-18T20:25:56Z | |
dc.date.available | 2018-09-18T20:25:56Z | |
dc.date.issued | 2014 | |
dc.identifier.issn | 1757-8981 | |
dc.identifier.uri | https://dspace.kpfu.ru/xmlui/handle/net/139817 | |
dc.description.abstract | © Published under licence by IOP Publishing Ltd. Magnetron discharge at reactive and working gases mixture atmosphere current-voltage characteristic (I-U) for different sputtering parameters is investigated. It is shown, that form of volt-ampere characteristic doesn't depend on gas supply scheme at vacuum chamber pressure 4- 6.10-2 Pa. Reactive gas (oxygen) flow increasing leads to making I-U transition part wider and amplification of difference between top and bottom parts of hysteresis loop I-U. Discharge voltage is less at oxygen and argon gases mixture atmosphere than at argon atmosphere. | |
dc.relation.ispartofseries | IOP Conference Series: Materials Science and Engineering | |
dc.title | Magnetron discharge volt-ampere characteristic investigation at thin film coating process | |
dc.type | Conference Paper | |
dc.relation.ispartofseries-issue | 1 | |
dc.relation.ispartofseries-volume | 69 | |
dc.collection | Публикации сотрудников КФУ | |
dc.source.id | SCOPUS17578981-2014-69-1-SID84919459240 |